Substrates¶
Substrates are the base materials on which you deposit thin films or grow materials. Proper substrate tracking ensures you can trace your samples back to their starting materials and identify batch-specific effects.
Overview¶
This schema package defines:
-
DTUSubstrate - An individual substrate wafer or piece with specific properties (size, thickness, surface orientation, supplier information)
-
DTUSubstrateBatch - A collection of substrates from the same supplier batch, sharing common properties. This enables efficient documentation when you purchase and use multiple identical substrates.
Both extend NOMAD's CompositeSystem entity, providing lab ID tracking and referenceable objects that can be linked from synthesis processes.
Typical Usage¶
- Document substrate batch: When substrates arrive, create a
DTUSubstrateBatchentry with supplier info, batch number, and common properties - Reference in synthesis: When performing sputtering or thermal evaporation, reference the substrate or substrate batch used
- Track consumption: Monitor which substrates have been used for which experiments
- Batch analysis: Identify if results correlate with specific substrate batches
Related Schemas¶
- Used in: Sputtering, Thermal Evaporation
- Creates: Samples and Libraries
Schema Documentation¶
DTUSubstrate¶
description: Schema for substrates in the DTU Nanolab.
inherits from: nomad_material_processing.general.CrystallineSubstrate, nomad.datamodel.data.EntryData
properties:
| name | type | |
|---|---|---|
| substrate_polishing | ['1 sided', '2 sided', 'none'] |
default=1 sided |
normalization:
If the elemental composition list is
empty, the normalizer will iterate over the components and extract all the
elements for populating the elemental composition list. If masses are provided for
all components and the elemental composition of all components contain atomic
fractions the normalizer will also calculate the atomic fractions for the
composite system. The populated elemental composition list is added to the results
by the normalizer in the System super class.
DTUSubstrateReference¶
inherits from: nomad.datamodel.metainfo.basesections.v1.CompositeSystemReference
properties:
| name | type | |
|---|---|---|
| reference | DTUSubstrate |
The reference to the substrate entity. |
normalization:
Will attempt to fill the reference from the lab_id or vice versa.
DTUSubstrateBatch¶
description: Schema for substrate batches in the DTU Nanolab.
inherits from: nomad.datamodel.metainfo.basesections.v1.Collection, nomad.datamodel.data.EntryData
properties:
| name | type | |
|---|---|---|
| material | str |
The material of the substrate. default= Si |
| supplier | str |
default=Siegert Wafer |
| substrate_polishing | ['1 sided', '2 sided', 'none'] |
default=1 sided |
| doping_type_of_substrate | ['N-type', 'P-type'] |
default=N-type |
| doping_of_substrate | float64 |
The doping of the substrate measured as the electrical resistivity. unit= meter * ohm, default=0.2 |
| doping_elements | str |
shape=['*'], default=['P'] |
| shape | ['Circular', 'Rectangular'] |
The shape of the substrate. Circular (wafer) or rectangular. If the shape is circular, the diameter is used to define the size of the substrate. If the shape is rectangular, the length and width are used to define the size of the substrate. default= Rectangular |
| diameter | float64 |
Only used if the shape is circular. The diameter of the substrate. unit= meter, default=0.1524 |
| length | float64 |
Only used if the shape is rectangular. The length of the substrate. unit= meter, default=0.04 |
| width | float64 |
Only used if the shape is rectangular. The width of the substrate. unit= meter, default=0.04 |
| thickness | float64 |
unit=meter, default=0.000675 |
| create_substrates | bool |
(Re)create the substrate entities. |
| number_of_substrates | int |
The number of substrates in the batch. |
| entities | DTUSubstrateReference |
References to the entities that make up the collection. sub-section, repeats |
| substrate_identifiers | nomad.datamodel.metainfo.basesections.v1.ReadableIdentifiers |
sub-section |
normalization:
The normalizer for the DTUSubstrateBatch class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
CleaningStep¶
inherits from: nomad.datamodel.metainfo.basesections.v1.ProcessStep
properties:
| name | type | |
|---|---|---|
| cleaning_agent | ['Acetone', 'Ethanol', 'H2O', 'IPA', 'N2-gun'] |
default=N2-gun |
| sonication | bool |
default=False |
DTUSubstrateCleaning¶
description: Schema for substrate cleaning at the DTU Nanolab.
inherits from: nomad.datamodel.metainfo.basesections.v1.Process, nomad.datamodel.data.EntryData
properties:
| name | type | |
|---|---|---|
| substrate_batch | DTUSubstrateBatch |
The substrate batch that was cleaned. |
| steps | CleaningStep |
An ordered list of all the dependant steps that make up this activity. sub-section, repeats |
normalization:
The normalizer for the DTUSubstrateCleaning class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
DTUSubstrateCutting¶
description: Schema for substrate cutting at the DTU Nanolab.
inherits from: nomad.datamodel.metainfo.basesections.v1.Process, nomad.datamodel.data.EntryData
properties:
| name | type | |
|---|---|---|
| substrate_batch | DTUSubstrateBatch |
The substrate batch that was cut. |
| instrument_name | str |
default=microSTRUCT vario from the company 3D-Micromac AG |
| laser_power | float64 |
unit=watt, default=50 |
| laser_wavelength | float64 |
unit=meter, default=5.32e-07 |
| repetition_rate | float64 |
unit=hertz, default=200 |
| pattern_repetitions | int |
default=6 |
| writing_speed | float64 |
unit=meter / second, default=0.05 |
normalization:
The normalizer for the DTUSubstrateCutting class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.