Sputter Deposition¶
Sputter deposition is a physical vapor deposition technique where material is ejected from targets by ion bombardment and deposited onto substrates. At DTU Nanolab, multi-target sputtering creates combinatorial libraries for efficient materials exploration.
Overview¶
This schema package defines:
- DTUSputtering - A sputter deposition process with detailed parameters for targets, gases, pressures, powers, and substrate handling
The sputtering process extends NOMAD's Process and Activity base classes, providing:
- Links to input entities (substrates, targets, gases) and output entities (samples/libraries)
- Deposition parameters (pressure, power, time, temperature)
- Multi-target configurations with independent control
- Gas flow and composition settings
- Automated workflow integration
Typical Usage¶
- Set up deposition: Reference substrates to use, targets for each source, gases for atmosphere, and the instrument
- Configure parameters: Set target powers, chamber pressure, gas flows, deposition time, substrate temperature
- Document gradient/pattern: For combinatorial libraries, describe the composition gradient or pattern
- Link output: Reference the DTUCombinatorialLibrary created by this process
- Track provenance: The sputtering entry links the entire chain: substrates + targets + gases → library
Parsing Workflow¶
The sputtering parser automatically processes machine log files and extracts relevant process information through a multi-step workflow:
- Data Logging: During deposition, more than 100 machine signals (pressure gauges, powers, flows, etc.) are logged through time using the native software of the sputtering tool (Lesker Eklipse). Relevant logged quantities include:
- Chamber pressure
- Flow rates of reactive and non-reactive gases
- Status of the S cracker
- Substrate temperature
-
Sputter target information and operating conditions (sputtering mode, power, shutter status, etc.)
-
Process Step Identification: The logged information is uploaded to the sputtering entry and rationalized using a custom parser. Important process steps are identified using conditional logic that uniquely describes each processing step. For example:
- The deposition step is defined as timestamps where at least one target is both on with a sustained plasma and in line of sight of the substrate (shutters open)
-
Other identified steps include: Temperature Ramping Up, Deposition, Cooling, etc.
-
Parameter Extraction: Once processing steps are identified, derived parameters that give insight into the process are automatically extracted. For instance:
- Deposition temperature is calculated as the average recorded temperature during the deposition step
-
Similar derived parameters are calculated for each process step
-
Schema Population: Derived parameters are routed to their relevant locations in the sputtering data schema, allowing easy access to:
- General quantities (e.g., deposition temperature)
-
Specific quantities (e.g., reflected RF power as a function of time during target plasma ignition)
-
Visualization: Process information is assembled into graphs providing quick process overview:
- Main deposition events represented as a function of time
- Visualization of elemental and gaseous source positions during combinatorial deposition
-
Target stability diagnostics (e.g., DC bias as a function of time during deposition for RF sputtering)
-
Library Generation: Based on user-provided substrate information, combinatorial libraries are automatically created following laboratory conventions. For example:
- Four square-shaped Si substrates and one rectangular glass substrate → 5 standalone combinatorial library instances
- Each library has harmonious naming conventions and references linking to the sputtering process and respective substrate types
Default graphs obtained from parsing a log file through the sputtering entry. (a) Position of the different substrates on the platen during deposition, relative to the sources, namely the reactive toxic gas inlet (H2S + PH3) and the Cu target and other sputtering chamber landmark. (b) Position of the substrate during mounting, defining the orientation of base coordinate system for the combinatorial library. (c) Process timeline graph representing the extent in time of different process-relevant events, such as the moments where reactive gases were flown in the chamber (PH3 On, H2S on) or the moment of the deposition itself. (d) The DC self-bias developed by the Cu target during the deposition.
Benefits of Automated Processing¶
With automatic log file processing, the time a user must spend on uploading data is minimized and the benefits outweigh the extra work by far.
Short-term benefits: - Human-readable plots automatically generated from log file data - Visualization of important parameters throughout the deposition process - Immediate diagnostic feedback on process stability
Long-term benefits: - Maintaining an overview of completed experiments - Easing the integration of collected data during the planning of future experiments - Facilitating the publication of synthesis data in accordance with FAIR principles
Key Parameters¶
- Target configurations: Multiple targets with independent power control
- Chamber conditions: Base pressure, working pressure, gas composition
- Deposition control: Time, rate, substrate rotation/motion for gradients
- Thermal management: Substrate temperature, heating/cooling
Related Schemas¶
- Input entities: Substrates, Targets, Gas Supplies
- Instrument: DTUInstrument (sputter tool)
- Output entities: DTUCombinatorialLibrary
- Follow-up processes: Library Cleaving, RTP
- Characterization: XRD, XPS, EDX, etc.
Schema Documentation¶
DtuSubstrateMounting¶
description: Section containing information about the mounting of the substrate.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| name | str |
The name of the substrate mounting. |
| substrate_batch | nomad_dtu_nanolab_plugin.schema_packages.substrate.DTUSubstrateBatch |
A reference to the batch of the substrate used. |
| substrate | nomad_dtu_nanolab_plugin.schema_packages.substrate.DTUSubstrate |
A reference to the substrate used. |
| relative_position | str |
The relative position of the substrate on the platen. |
| position_x | float64 |
The x-coordinate of the substrate on the platen. unit= meter |
| position_y | float64 |
The y-coordinate of the substrate on the platen. unit= meter |
| rotation | float64 |
The rotation of the substrate on the platen, relative to the width (x-axis) and height (y-axis) of the substrate. unit= radian |
| method_of_contact | ['clamps', 'frame', 'other'] |
The method of contact between the substrate and the platen. default= clamps |
| mask_used | bool |
Whether a mask was used during the deposition. default= False |
| mask_description | str |
A description of the mask used. |
normalization:
The normalizer for the DtuSubstrateMounting class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
DtuPowerSetPoint¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The set point power. shape= ['*'], unit=watt |
DTUSputterPowerSupply¶
inherits from: nomad_material_processing.vapor_deposition.pvd.general.PVDEvaporationSource
properties:
| name | type | |
|---|---|---|
| power_type | ['DC', 'RF', 'pulsed_DC'] |
default=RF |
| avg_power_sp | float64 |
unit=kilogram * meter ** 2 / second ** 3 |
| power_sp | DtuPowerSetPoint |
sub-section |
DtuDCBias¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The DC self bias. shape= ['*'], unit=volt |
DtuForwardPower¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The forward power. shape= ['*'], unit=watt |
DtuReflectedPower¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The reflected power. shape= ['*'], unit=watt |
DTUSputterRFPowerSupply¶
inherits from: DTUSputterPowerSupply
properties:
| name | type | |
|---|---|---|
| power_type | ['RF'] |
The type of power supply. default= RF |
| avg_dc_bias | float64 |
The average DC bias. unit= volt |
| avg_fwd_power | float64 |
The average forward power. unit= kilogram * meter ** 2 / second ** 3 |
| avg_rfl_power | float64 |
The average reflected power. unit= kilogram * meter ** 2 / second ** 3 |
| dc_bias | DtuDCBias |
sub-section |
| fwd_power | DtuForwardPower |
sub-section |
| rfl_power | DtuReflectedPower |
sub-section |
DtuVoltage¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The voltage of the power supply. shape= ['*'], unit=volt |
DtuCurrent¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The current of the power supply. shape= ['*'], unit=ampere |
DTUSputterDCPowerSupply¶
inherits from: DTUSputterPowerSupply
properties:
| name | type | |
|---|---|---|
| avg_voltage | float64 |
The average voltage of the DC power supply. unit= volt |
| avg_current | float64 |
The average current of the DC power supply. unit= ampere |
| voltage | DtuVoltage |
sub-section |
| current | DtuCurrent |
sub-section |
DtuPulseFrequency¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The pulse frequency of the PDC power supply shape= ['*'], unit=hertz |
DtuDeadTime¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The dead time of the PDC power supply. shape= ['*'], unit=second |
DTUSputterPulsedDCPowerSupply¶
inherits from: DTUSputterDCPowerSupply
properties:
| name | type | |
|---|---|---|
| avg_pulse_frequency | float64 |
The average pulse frequency of the PDC power supply. unit= 1 / second |
| avg_dead_time | float64 |
The average dead time of the PDC power supply. unit= second |
| pulse_frequency | DtuPulseFrequency |
sub-section |
| dead_time | DtuDeadTime |
sub-section |
Substrate¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| setpoint_temperature | float64 |
unit=kelvin |
| corrected_real_temperature | float64 |
unit=kelvin |
normalization:
The normalizer for the Substrate class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
SCrackerOverview¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| zone1_temperature | float64 |
The temperature of sulfur cracker zone 1. unit= kelvin |
| zone1_temperature_setpoint | float64 |
The temperature setpoint of sulfur cracker zone 1. unit= kelvin |
| zone2_temperature | float64 |
The temperature of sulfur cracker zone 2. unit= kelvin |
| zone3_temperature | float64 |
The temperature of sulfur cracker zone 3. unit= kelvin |
| valve_on_time | float64 |
The valve on time of the sulfur cracker zone 2. unit= second |
| valve_frequency | float64 |
The valve frequency of the sulfur cracker zone 2. unit= 1 / second |
DtuZoneTemp¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The temperature of zone 1. shape= ['*'], unit=kelvin |
DtuValveOnTime¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The valve on time. shape= ['*'], unit=second |
DtuValveFrequency¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The valve frequency. shape= ['*'], unit=hertz |
SCracker¶
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| avg_zone1_temperature | float64 |
The average temperature of sulfur cracker zone 1. unit= kelvin |
| avg_zone2_temperature | float64 |
The average temperature of sulfur cracker zone 2. unit= kelvin |
| avg_zone3_temperature | float64 |
The average temperature of sulfur cracker zone 3. unit= kelvin |
| avg_valve_on_time | float64 |
The average valve on time of the sulfur cracker zone 2. unit= second |
| avg_valve_frequency | float64 |
The average valve frequency of the sulfur cracker zone 2. unit= 1 / second |
| zone1_temperature | DtuZoneTemp |
sub-section |
| zone2_temperature | DtuZoneTemp |
sub-section |
| zone3_temperature | DtuZoneTemp |
sub-section |
| valve_on_time | DtuValveOnTime |
sub-section |
| valve_frequency | DtuValveFrequency |
sub-section |
DTUShutter¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | bool |
Position of the substrate shutter (1: open, 0: closed). shape= ['*'] |
| mode_value | bool |
Most represented (mode value) shutter state (1: mostly pen, 0: mostly closed). |
DTUTargetReference¶
inherits from: nomad.datamodel.metainfo.basesections.v1.CompositeSystemReference
properties:
| name | type | |
|---|---|---|
| reference | nomad_dtu_nanolab_plugin.schema_packages.target.DTUTarget |
A reference to a NOMAD Target entry. |
normalization:
The normalizer for the DtuTargetReference class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
DTUTargetComponent¶
inherits from: nomad.datamodel.metainfo.basesections.v1.Component
properties:
| name | type | |
|---|---|---|
| system | nomad_dtu_nanolab_plugin.schema_packages.target.DTUTarget |
The target material. |
| lab_id | str |
The lab ID of the target material. |
normalization without further documentation
DTUSource¶
inherits from: nomad_material_processing.vapor_deposition.pvd.general.PVDSource
DtuPlasma¶
description: Class similar a DTUSputteringSource with the exception that it does not have a material section
inherits from: DTUSource
properties:
| name | type | |
|---|---|---|
| source_shutter_open | DTUShutter |
sub-section |
| vapor_source | DTUSputterPowerSupply |
The power supply of the sputtering source. sub-section |
DTUSputteringSource¶
description: Class autogenerated from yaml schema.
inherits from: DtuPlasma
properties:
| name | type | |
|---|---|---|
| material | DTUTargetComponent |
The source of the material that is being evaporated. Example: A sputtering target, a powder in a crucible, etc. sub-section, repeats |
normalization:
The normalizer for the DTUSource class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
DtuReactiveGasComponent¶
inherits from: nomad.datamodel.metainfo.basesections.v1.Component
properties:
| name | type | |
|---|---|---|
| system | nomad_dtu_nanolab_plugin.schema_packages.gas.DTUGasSupply |
The reactive gas supply. |
DtuMassFlowController¶
inherits from: nomad.datamodel.metainfo.basesections.v1.Component
properties:
| name | type | |
|---|---|---|
| flow | nomad_material_processing.vapor_deposition.general.VolumetricFlowRate |
sub-section |
DtuReactiveGasSource¶
inherits from: DTUSource
properties:
| name | type | |
|---|---|---|
| material | DtuReactiveGasComponent |
The source of the material that is being evaporated. Example: A sputtering target, a powder in a crucible, etc. sub-section, repeats |
| vapor_source | DtuMassFlowController |
Example: A heater, a filament, a laser, etc. sub-section |
DtuCrackerMaterial¶
inherits from: nomad.datamodel.metainfo.basesections.v1.PureSubstanceComponent
normalization:
If none is set, the normalizer will set the name of the component to be the molecular formula of the substance.
DtuCrackerSource¶
inherits from: DTUSource
properties:
| name | type | |
|---|---|---|
| material | DtuCrackerMaterial |
The source of the material that is being evaporated. Example: A sputtering target, a powder in a crucible, etc. sub-section, repeats |
| vapor_source | SCracker |
Example: A heater, a filament, a laser, etc. sub-section |
| valve_open | DTUShutter |
sub-section |
DTUGasFlow¶
description: Class autogenerated from yaml schema.
inherits from: nomad_material_processing.vapor_deposition.general.GasFlow, nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| gas_name | str |
The name of the gas. |
| gas_supply_reference | nomad_dtu_nanolab_plugin.schema_packages.gas.DTUGasSupply |
The gas supply used. |
normalization:
The normalizer for the DTUGasFlow class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
DtuTemperature¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float64 |
The temperature of the heater. shape= ['*'], unit=kelvin |
DtuSubstrateHeater¶
description: Custom class for the substrate heater.
inherits from: nomad_material_processing.vapor_deposition.general.SubstrateHeater
properties:
| name | type | |
|---|---|---|
| avg_temperature_1 | float64 |
The average temperature of the heater as measured by thermocouple 1. unit= kelvin |
| avg_temperature_2 | float64 |
The average temperature of the heater as measured by thermocouple 2. unit= kelvin |
| avg_temperature_setpoint | float64 |
The average temperature setpoint of the heater. unit= kelvin |
| temperature_1 | DtuTemperature |
sub-section |
| temperature_2 | DtuTemperature |
sub-section |
| temperature_setpoint | DtuTemperature |
sub-section |
DTUChamberEnvironment¶
description: Class autogenerated from yaml schema.
inherits from: nomad_material_processing.vapor_deposition.general.ChamberEnvironment, nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| gas_flow | DTUGasFlow |
sub-section, repeats |
| platen_bias | DtuPlasma |
sub-section |
| heater | DtuSubstrateHeater |
sub-section |
normalization:
The normalizer for the DTUChamberEnvironment class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
DTUSteps¶
description: Class autogenerated from yaml schema.
inherits from: nomad_material_processing.vapor_deposition.pvd.general.PVDStep, nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| sources | DTUSource |
sub-section, repeats |
| environment | DTUChamberEnvironment |
sub-section |
normalization:
The normalizer for the DTUSteps class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
EndOfProcess¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| taken_out | ['back', 'front'] |
default=front |
| heater_temperature | float64 |
unit=kelvin |
| time_in_chamber_after_deposition | float64 |
unit=second |
| chamber_purged | bool |
default=False |
InstrumentParameters¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.metainfo.basesections.v1.InstrumentReference, nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| platen_rotation | float64 |
unit=radian |
| stage_used | ['cooling', 'heating'] |
default=heating |
normalization:
The normalizer for the InstrumentParameters class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
SourceOverview¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| target_name | str |
The name of the gun on which the target in mounted. |
| target_material | str |
The material of the target. |
| target_usage | float64 |
The accumulated power the target has been exposed to at the end of the deposition unit= hour * kilowatt |
| applied_power | float64 |
The applied power. unit= kilogram * meter ** 2 / second ** 3 |
| power_type | ['DC', 'RF', 'pulsed_DC'] |
The type of power supply. default= RF |
| average_voltage | float64 |
The average voltage (DC bias in RF) of the power supply. unit= volt |
| std_voltage | float64 |
'The standard deviation of the voltage (DC bias in RF) of the power supply.' unit= volt |
| start_voltage | float64 |
The voltage (DC bias in RF) at the start of the deposition. unit= volt |
| end_voltage | float64 |
The voltage (DC bias in RF) at the end of the deposition. unit= volt |
| start_end_voltage | float64 |
The difference between the start and end voltage (DC bias in RF). unit= volt |
| max_voltage | float64 |
The maximum voltage (DC bias in RF) during the deposition. unit= volt |
| min_voltage | float64 |
The minimum voltage (DC bias in RF) during the deposition. unit= volt |
| range_voltage | float64 |
The difference between min and max voltage (DC bias in RF). unit= volt |
| voltage_comments | str |
Comments on the voltage (DC bias in RF) during the deposition. |
| target_id | DTUTargetReference |
A reference to the target used. sub-section |
UsedGas¶
description: Class autogenerated from yaml schema.
inherits from: nomad_material_processing.vapor_deposition.general.GasFlow, nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| gas_name | str |
|
| used_gas_supply | nomad.datamodel.metainfo.basesections.v1.CompositeSystem |
normalization:
The normalizer for the UsedGas class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
SourceRampUp¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| target_name | str |
The name of the gun on which the target in mounted. |
| plasma_ignition_power | float64 |
The power at which plasma ignites. unit= kilogram * meter ** 2 / second ** 3 |
| plasma_ignition_pressure | float64 |
The pressure at which the plasma was ignited. unit= kilogram / meter / second ** 2 |
SourcePresput¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| target_name | str |
The name of the gun on which the target in mounted. |
| presput_time | float64 |
The total presputtering time. unit= second |
| presput_power | float64 |
The average power during presputtering. unit= kilogram * meter ** 2 / second ** 3 |
| presput_pressure | float64 |
The average pressure during presputtering. unit= kilogram / meter / second ** 2 |
| presput_ar_flow | float64 |
The average Ar flow during presputtering. unit= meter ** 3 / second |
SourceDepRate¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| target_name | str |
|
| source_deprate | float64 |
unit=meter / second |
| source_deprate_ref_mat | str |
SulfurCrackerPressure¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| sulfur_partial_pressure | float64 |
unit=kilogram / meter / second ** 2 |
| sulfur_flow | float64 |
Flow of sulfur unit= meter ** 3 / second |
normalization:
The normalizer for the SulfurCrackerPressure class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
DepositionParameters¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| deposition_temperature | float64 |
The temperature of the deposition as measured by thermocouple 1. unit= kelvin, default=300 |
| deposition_temperature_2 | float64 |
The temperature of the deposition as measured by thermocouple 2. unit= kelvin, default=300 |
| deposition_temperature_setpoint | float64 |
The temperature setpoint of the deposition. unit= kelvin, default=300 |
| deposition_true_temperature | float64 |
The corrected real temperature of the deposition as calculated with : 0.905 * (0.5 * (deposition_temperature + deposition_temperature_2)) + 12 unit= kelvin |
| deposition_time | float64 |
The total deposition time. unit= second, default=1800 |
| platen_rotation | float64 |
The platen rotation angle during the deposition. unit= radian |
| sputter_pressure | float64 |
The pressure during sputtering as measured by the capman gauge. unit= kilogram / meter / second ** 2, default=0.6666 |
| material_space | str |
The material space explored by the deposition. |
| ar_flow | float64 |
Flow of 100% Ar in equivalent flow at standard conditions 0, i.e. the equivalent rate at a temperature of 0 °C (273.15 K) and a pressure of 1 atm (101325 Pa). unit= meter ** 3 / second |
| ar_partial_pressure | float64 |
The Ar partial pressure during the deposition. unit= kilogram / meter / second ** 2 |
| h2s_in_ar_flow | float64 |
Flow of 10% H2S in Ar in equivalent flow at standard conditions 0, i.e. the equivalent rate at a temperature of 0 °C (273.15 K) and a pressure of 1 atm (101325 Pa). unit= meter ** 3 / second |
| h2s_partial_pressure | float64 |
The H2S partial pressure during the deposition. unit= kilogram / meter / second ** 2 |
| nh3_in_ar_flow | float64 |
Flow of 10% NH3 in Ar in equivalent flow at standard conditions 0, i.e. the equivalent rate at a temperature of 0 °C (273.15 K) and a pressure of 1 atm (101325 Pa). unit= meter ** 3 / second |
| nh3_partial_pressure | float64 |
The NH3 partial pressure during the deposition. unit= kilogram / meter / second ** 2 |
| ph3_in_ar_flow | float64 |
Flow of 10% PH3 in Ar in equivalent flow at standard conditions 0, i.e. the equivalent rate at a temperature of 0 °C (273.15 K) and a pressure of 1 atm (101325 Pa). unit= meter ** 3 / second |
| ph3_partial_pressure | float64 |
The PH3 partial pressure during the deposition unit= kilogram / meter / second ** 2 |
| n2_flow | float64 |
Flow of 100% N2 in equivalent flow at standard conditions 0, i.e. the equivalent rate at a temperature of 0 °C (273.15 K) and a pressure of 1 atm (101325 Pa). unit= meter ** 3 / second |
| n2_partial_pressure | float64 |
The N2 partial pressure during the deposition. unit= kilogram / meter / second ** 2 |
| o2_in_ar_flow | float64 |
Flow of 20% O2 in Ar in equivalent flow at standard conditions 0, i.e. the equivalent rate at a temperature of 0 °C (273.15 K) and a pressure of 1 atm (101325 Pa). unit= meter ** 3 / second |
| o2_partial_pressure | float64 |
The O2 partial pressure during the deposition. unit= kilogram / meter / second ** 2 |
| ph3_h2s_ratio | float64 |
The PH3/H2S ratio (if applicable). |
| magkeeper3 | SourceOverview |
sub-section |
| magkeeper4 | SourceOverview |
sub-section |
| taurus | SourceOverview |
sub-section |
| s_cracker | SCrackerOverview |
sub-section |
| used_gases | UsedGas |
sub-section, repeats |
normalization:
The normalizer for the DepositionParameters class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
TempRampUp¶
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| duration | float64 |
The duration of the temperature ramp up. unit= second |
| start_temperature_setpoint | float64 |
The start temperature setpoint. unit= kelvin |
| end_temperature_setpoint | float64 |
The end temperature setpoint. unit= kelvin |
| temperature_slope | float64 |
The temperature slope. unit= kelvin / second |
| avg_capman_pressure | float64 |
The average pressure during the temperature ramp up. unit= kilogram / meter / second ** 2 |
| avg_ar_flow | float64 |
The average Ar flow during the temperature ramp up. unit= meter ** 3 / second |
| avg_h2s_in_ar_flow | float64 |
The average H2S flow during the temperature ramp up. unit= meter ** 3 / second |
| avg_ph3_in_ar_flow | float64 |
The average PH3 flow during the temperature ramp up. unit= meter ** 3 / second |
| cracker_enabled | bool |
Boolean to indicate if the cracker was enabled. default= False |
| heating_procedure | str |
Comment on the heating procedure. |
TempRampDown¶
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| duration | float64 |
The duration of the temperature ramp down. unit= second |
| start_temperature | float64 |
The start temperature. unit= kelvin |
| end_temperature | float64 |
The end temperature. unit= kelvin |
| avg_capman_pressure | float64 |
The average pressure during the temperature ramp down. unit= kilogram / meter / second ** 2 |
| avg_ar_flow | float64 |
The average Ar flow during the temperature ramp down. unit= meter ** 3 / second |
| avg_h2s_in_ar_flow | float64 |
The average H2S flow during the temperature ramp down. unit= meter ** 3 / second |
| avg_ph3_in_ar_flow | float64 |
The average PH3 flow during the temperature ramp down. unit= meter ** 3 / second |
| cracker_enabled | bool |
Boolean to indicate if the cracker was enabled. default= False |
| anion_input_cutoff_temperature | float64 |
The temperature at which the anion input (H2S, S-cracker, PH3, NH3, O2 or N2) was cut off.' unit= kelvin |
| cooling_procedure | str |
Comment on the cooling procedure. |
DtuFlag¶
description: Class autogenerated from yaml schema.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| flag | str |
Flag name associated with the deposition. Flags are used to indicate issues that occurred during the deposition (see description). |
| flag_description | str |
normalization:
The normalizer for the DtuFlag class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
DTUSputtering¶
description: Class autogenerated from yaml schema.
inherits from: nomad_material_processing.vapor_deposition.pvd.sputtering.SputterDeposition, nomad.datamodel.metainfo.plot.PlotSection, nomad.datamodel.data.EntryData
properties:
| name | type | |
|---|---|---|
| lab_id | str |
The ID of the run. Format: user_XXXX_ElemementSymbol |
| location | str |
location of the experiment. default= DTU; IDOL Lab |
| log_file | str |
Cell to upload the log file containing the deposition data. |
| process_log_file | bool |
Boolean to indicate if the log_file should be processed. default= True |
| overwrite | bool |
Boolean to indicate if the data present in the class should be overwritten by data incoming from the log file. default= True |
| cracker_warmup_log_file | str |
Cell to upload the log file containing the cracker warmup data. |
| platen_used | ['A', 'B'] |
The platen used for the deposition. |
| base_pressure | float64 |
The base pressure of the chamber before deposition. unit= kilogram / meter / second ** 2 |
| sulfur_partial_pressure | float64 |
The sulfur partial pressure, as estimated or measured. unit= kilogram / meter / second ** 2 |
| target_image_before | str |
Cell to upload the image of the target before the deposition. |
| target_image_after | str |
Cell to upload the image of the target after the deposition. |
| plasma_image | str |
Cell to upload the image of the plasma during the deposition. |
| sample_image | str |
Cell to upload the image of the sample. |
| optix_spectra | str |
Cell to upload the Optix spectra data. |
| rga_file | str |
Cell to upload the RGA data associated by the Optix spectra data. |
| optix_power_type | ['DC', 'PDC'] |
The type of power used for the Optix. DC (default) or PDC. |
| optix_current | float64 |
The current used for the Optix. unit= ampere |
| flags | DtuFlag |
sub-section, repeats |
| substrates | DtuSubstrateMounting |
sub-section, repeats |
| steps | DTUSteps |
The steps of the deposition process. sub-section, repeats |
| end_of_process | EndOfProcess |
sub-section |
| instruments | InstrumentParameters |
A list of all the instruments and their role in this process. sub-section, repeats |
| deposition_parameters | DepositionParameters |
sub-section |
| source_ramp_up | SourceRampUp |
sub-section, repeats |
| source_presput | SourcePresput |
sub-section, repeats |
| source_deprate | SourceDepRate |
sub-section, repeats |
| sulfur_cracker_pressure | SulfurCrackerPressure |
sub-section |
| temperature_ramp_up | TempRampUp |
sub-section |
| temperature_ramp_down | TempRampDown |
sub-section |
normalization:
The normalizer for the DTUSputtering class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.